ASML plans to launch advanced Hyper-NA EUV lithography equipment

2024-07-02 22:00
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According to the Chosun Ilbo, Dutch lithography machine manufacturer ASML plans to launch advanced Hyper-NA EUV lithography equipment for sub-1 nanometer processes in 2030. However, the price of each device is expected to exceed US$724 million, which may discourage semiconductor wafer foundry manufacturers such as TSMC, Samsung and Intel.