The company has mentioned before that it already has photolithography alignment inspection machine products and has won the bid for the Shanghai Xinwei Semiconductor procurement project. What role does the photolithography alignment inspection machine play in the various processes of semiconductor lithography? What is the prospect of domestic substitution? Thank you

Tianjue Technology: Hello, thank you for your attention to the company. MueTec won the bid for Shanghai Xinwei's overlay error measurement equipment in 2021. Overlay error measurement equipment is mainly used to measure the alignment error between the front and back stacks in the semiconductor manufacturing process. MueTec's overlay error measurement equipment can cover 65-90nm process nodes. At present, the company's Suzhou team and MueTec team are working together to develop overlay error measurement equipment for more advanced processes.